发明名称 Titanium-doped indium oxide films
摘要 An apparatus and methods of forming the apparatus include a film of transparent conductive titanium-doped indium oxide for use in a variety of configurations and systems. The film of transparent conductive titanium-doped indium oxide may be structured as one or more monolayers. The film of transparent conductive titanium-doped indium oxide may be formed using atomic layer deposition.
申请公布号 US8273177(B2) 申请公布日期 2012.09.25
申请号 US20090551023 申请日期 2009.08.31
申请人 AHN KIE Y.;FORBES LEONARD;MICRON TECHNOLOGY, INC. 发明人 AHN KIE Y.;FORBES LEONARD
分类号 C30B29/10 主分类号 C30B29/10
代理机构 代理人
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