| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemical amplifying resist material that provides high resolution and storage stability, and is useful for microfabrication using an electron ray, a far-ultraviolet ray, and an extreme ultraviolet ray. <P>SOLUTION: A chemical amplifying resist material contains as essential components: (A) a tertiary amine compound represented by the formula (1); (B) an acid generating agent represented by the formula (2); (C) a base resin, which is a resin insoluble or poorly-soluble to alkaline developer having an acidic functional group protected by an acid labile group, and turns soluble to alkaline developer when the acid labile group is deprotected; and (D) organic solvent. <P>COPYRIGHT: (C)2012,JPO&INPIT |
