| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition that allows formation of an excellent contact hole pattern even in a substrate in which illumination reflection remains, and a resist film and a negative pattern formation method using the same. <P>SOLUTION: A resist composition comprises: a resin (A) including a repeating unit (a) of a following general formula (R1-a) or (R1-b), a repeating unit (b) of a following general formula (R2), a repeating unit (c) of a following general formula (R3), and a repeating unit (d) different from (c) and containing an acid-decomposable group; a compound (B) that generates acid by exposure to an actinic ray or radiation; and a specific compound (C). <P>COPYRIGHT: (C)2012,JPO&INPIT |
