OXIDE SUBSTRATE, AND MANUFACTURING METHOD FOR SAME

摘要

Provided is an oxide substrate that has a planar surface at an atomic layer level, and that is suitable for the formation of perovskite manganate thin films. One embodiment of the present invention provides an oxide single-crystal substrate (10) having: a single-crystal support substrate (1) comprising SrTiO3 having a (210) surface orientation; and a single-crystal foundation layer (2) of (LaAlO3)0.3-(SrAl0.5Ta0.5O3)0.7, i.e. LSAT, formed on the surface of the (210) plane of the support substrate. In another embodiment of the present invention, the LSAT foundation layer (2A) is formed in an amorphous state.