OFF-ANGLED HEATING OF THE UNDERSIDE OF A SUBSTRATE USING A LAMP ASSEMBLY
摘要
Disclosed are method and apparatus for treating a substrate. The apparatus is a dual-function process chamber that may perform both a material process and a thermal process on a substrate. The chamber has an annular radiant source disposed between a processing location and a transportation location of the chamber. Lift pins have length sufficient to maintain the substrate at the processing location while the substrate support is lowered below the radiant source plane to afford radiant heating of the substrate. A method of processing a substrate having apertures formed in a first surface thereof includes depositing material on the first surface in the apertures and reflowing the material by heating a second surface of the substrate opposite the first surface. A second material can then be deposited, filling the apertures partly or completely. Alternately, a cyclical deposition/reflow process may be performed.
申请公布号
WO2012125469(A2)
申请公布日期
2012.09.20
申请号
WO2012US28521
申请日期
2012.03.09
申请人
APPLIED MATERIALS, INC.;EWERT, MAURICE E.;SUBRAMANI, ANANTHA K.;KELKAR, UMESH M.;BALASUBRAMANYAM, CHANDRASEKHAR;RANISH, JOSEPH M.
发明人
EWERT, MAURICE E.;SUBRAMANI, ANANTHA K.;KELKAR, UMESH M.;BALASUBRAMANYAM, CHANDRASEKHAR;RANISH, JOSEPH M.