IN-MOLD DUAL SHOT MASKING

摘要

A method of selectively applying a pattern to a molded part comprises the steps of forming a mold (8); molding a three-dimensional object (10) having at least one face (12) in the mold, the three-dimensional object (10) being formed of a first material. Masking the at least the one face (12) of the three-dimensional object (10) with a mask (14) comprising a reverse image of a desired pattern while the three-dimensional object is still in the mold. Overmolding the three-dimensional object (10) with a second material to provide the reverse image. Removing the three-dimensional object (10) from the mold, coating at least the one face 12 of the three-dimensional object with a third material; and removing the second material to reveal the desired image.