发明名称 APPARATUS AND PROCESS FOR REFILLING A BUBBLER
摘要 <p>A chemical vapour deposition process has a bubbler vapour that is recharged from time to time (1). The bubbler is charged with a fluid (3) through which a carrier gas is passed in bubble form. When the bubbler is filled to a minimum depth (4) an exact quantity of the fluid substance (3) is drawn from a reservoir (15) via an intermediate container (25) filled with an inert gas at a pressure P1. The reservoir is charged with an inert gas to a pressure (P2) that is greater than that of P1. The pressure differential drives a pre-determined quantity of the substance from the reservoir via a tube (17) holding inert gas at a pressure (P3) that is less than P2 to the intermediate container. An independent claim is also included for the method of recharging the chemical vapor deposition bubbler using the device.</p>
申请公布号 KR101183363(B1) 申请公布日期 2012.09.14
申请号 KR20050013556 申请日期 2005.02.18
申请人 发明人
分类号 B01J4/02;C23C16/00;B01B1/00;B01J7/02;C23C16/448;F04F1/06;G01F11/28;G05D9/04;G05D9/12 主分类号 B01J4/02
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