发明名称 LIGHTING OPTICAL DEVICE AND EXPOSURE SYSTEM
摘要 <p>An illumination optical apparatus is able to adjust each of pupil luminance distributions at respective points on a surface to be illuminated to being almost uniform, while maintaining or adjusting an illuminance distribution on the surface to be illuminated to being almost uniform. The illumination optical apparatus illuminates the surface to be illuminated (M, W), with a light beam from a light source (1). The apparatus is provided with a pupil distribution forming device (1-4) for forming a pupil luminance distribution with a predetermined luminance distribution on an illumination pupil plane; and an adjuster (8, 9) for independently adjusting each of pupil luminance distributions about respective points on the surface to be illuminated. The adjuster has a plurality of adjustment surfaces each of which is disposed in an optical path between the pupil distribution forming device and the surface to be illuminated and has a predetermined transmittance distribution or reflectance distribution.</p>
申请公布号 KR20120101599(A) 申请公布日期 2012.09.13
申请号 KR20127022531 申请日期 2005.08.03
申请人 NIKON CORPORATION 发明人 TANAKA HIROHISA;SHIGEMATSU KOJI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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