发明名称 HIGH TEMPERATURE PERFORMANCE CAPABLE GALLIUM NITRIDE TRANSISTOR
摘要 A transistor device capable of high performance at high temperatures. The transistor comprises a gate having a contact layer that contacts the active region. The gate contact layer is made of a material that has a high Schottky barrier when used in conjunction with a particular semiconductor system (e.g., Group-III nitrides) and exhibits decreased degradation when operating at high temperatures. The device may also incorporate a field plate to further increase the operating lifetime of the device.
申请公布号 US2012228675(A1) 申请公布日期 2012.09.13
申请号 US201213480328 申请日期 2012.05.24
申请人 HEIKMAN STEN;WU YIFENG;CREE, INC. 发明人 HEIKMAN STEN;WU YIFENG
分类号 H01L29/778 主分类号 H01L29/778
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