| 摘要 |
The invention relates to a method for depositing multi-layered layers and/or gradient layers on at least one substrate in an inline plasma coating installation comprising at least one process chamber in which at least two individual plasma sources are successively arranged in the transport direction of the substrate, by means of plasma-assisted chemical gas phase deposition. The aim of the invention is to provide such a method by which means a plurality of different layers in a stack of layers, or a layer having properties that change according to its thickness, can be produced on at least one substrate in a single process chamber during the transport of the substrate through the process chamber. To this end, according to such a method, the at least two plasma sources are operated under different process conditions at excitation frequencies of between 10 kHz and 2,45 GHz, at least one of the at least two plasma sources is pulsed, and the substrate is continuously transported through the coating areas of the individual plasma sources, at least one defined double-layered stack comprising individual layers having different properties and/or at least one defined gradient layer being deposited on the substrate. |
