发明名称 Metal Salt-Containing Composition, Substrate, Manufacturing Method of Substrate
摘要 An object of the present invention is to provide a metal salt-containing composition which is applicable to many metal source materials, and can be used for forming a compact and uniform metal oxide film comparable to those formed according to a sputtering method, as well as to provide a substrate having a metal complex film on the surface thereof obtained using the metal salt-containing composition, and a substrate having a metal complex film on the surface thereof obtained by further heating the substrate. Moreover, another object of the present invention is to provide a method for manufacturing a substrate having such a metal complex film on the surface thereof. According to the present invention, a metal salt-containing composition containing a metal salt, a polyvalent carboxylic acid having a cis-form structure, and a solvent, in which: the molar ratio of the polyvalent carboxylic acid to the metal salt is not less than 0.5 and not more than 4.0; the moisture content of the composition is not less than 0.05% by weight is used in an application method to apply on a substrate. Thereafter, a two-step heat treatment is carried out.
申请公布号 US2012230900(A1) 申请公布日期 2012.09.13
申请号 US200913498563 申请日期 2009.09.28
申请人 SAITO YASUTERU;IKE NAOKI;DAI-ICHI KOGYO SEIYAKU CO., LTD. 发明人 SAITO YASUTERU;IKE NAOKI
分类号 C01B13/00;B05D3/02;C01F5/00;C01F7/02;C01F11/02;C01F17/00;C01G3/02;C01G5/00;C01G9/02;C01G15/00;C01G19/02;C01G23/04;C01G25/02;C01G27/02;C01G30/00;C01G33/00;C01G35/00;C01G37/02;C01G41/02;C01G49/02;C01G53/04;C23C30/00 主分类号 C01B13/00
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