STORAGE AREA PATTERNING FORMATION METHOD OF OPTICAL MULTIPLE RECORDING ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a patterning formation method with which each area of a thin film made of specific photochromic compounds can be easily formed through patterning in a storage area of multiple recording.

SOLUTION: Each area of a thin film is formed in a storage area having any of at least three or more types of absorption spectra by applying one or more treatments among an irradiation treatment of ultraviolet light of a controlled amount of light, a heating treatment of different temperatures and an irradiation treatment of a laser beam of a controlled amount of light to the thin film of specific diaryl ethane compounds for each predetermined area.

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