发明名称 |
Systems and methods for target material delivery protection in a laser produced plasma EUV light source |
摘要 |
A device is disclosed herein which may comprise a chamber, a source providing a stream of target material droplets delivering target material to an irradiation region in the chamber along a path between a target material release point and the irradiation region, a gas flow in the chamber, at least a portion of the gas flowing in a direction toward the droplet stream, a system producing a laser beam irradiating droplets at the irradiation region to generate a plasma producing EUV radiation, and a shroud positioned along a portion of said stream, said shroud having a first shroud portion shielding droplets from said flow and an opposed open portion. |
申请公布号 |
US8263953(B2) |
申请公布日期 |
2012.09.11 |
申请号 |
US201113075500 |
申请日期 |
2011.03.30 |
申请人 |
FOMENKOV IGOR V.;PARTLO WILLIAM N.;CYMER, INC. |
发明人 |
FOMENKOV IGOR V.;PARTLO WILLIAM N. |
分类号 |
H01J35/00;G01J3/10;G21G5/00 |
主分类号 |
H01J35/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|