发明名称 |
Coating and developing apparatus, developing method and non-transitory medium |
摘要 |
A coating and developing apparatus develops a substrate of which surface is coated with resist and exposed to lights. The coating and developing apparatus includes a developing module; a cleaning module; and a transfer mechanism configured to transfer a substrate developed by the developing module to the cleaning module. The developing module includes an airtightly sealed processing vessel configured to form a processing atmosphere; a temperature control plate provided in the processing vessel and mounts thereon the substrate and cools the substrate; and an atmosphere gas supply unit configured to supply an atmosphere gas including mist of a developing solution to a surface of the substrate within the processing vessel. The cleaning module includes a mounting table configured to mount thereon the substrate; and a cleaning solution supply unit configured to supply a cleaning solution to the substrate mounted on the mounting table. |
申请公布号 |
US8262300(B2) |
申请公布日期 |
2012.09.11 |
申请号 |
US201113025300 |
申请日期 |
2011.02.11 |
申请人 |
TAKIGUCHI YASUSHI;YAMAMOTO TARO;ARIMA HIROSHI;YOSHIHARA KOUSUKE;YOSHIDA YUICHI;TOKYO ELECTRON LIMITED |
发明人 |
TAKIGUCHI YASUSHI;YAMAMOTO TARO;ARIMA HIROSHI;YOSHIHARA KOUSUKE;YOSHIDA YUICHI |
分类号 |
G03B13/00;G03D5/00 |
主分类号 |
G03B13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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