| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inspection device and an inspection method capable of reducing unnecessary defect correction by suppressing excessive defect detection. <P>SOLUTION: The optical image of a mask 101 is obtained from a sensor 106. The pattern size of the optical image and the pattern size of a reference image used as a reference for determination are measured to obtain a first error therefrom. The transfer images of the optical image of the mask 101 and the reference image are estimated, and the pattern sizes of the transfer images are determined to obtain a second error. The transfer images are compared with each other. When a difference exceeds a threshold value, a defect is determined. The second error in the defect determined place is corrected by the first error. <P>COPYRIGHT: (C)2012,JPO&INPIT |
