PLASMA GENERATION APPARATUS AND SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A plasma generation apparatus and a substrate processing apparatus are provided to reduce lattice defects density of a substrate caused by plasma impacts by maintaining the substrate in a floating state. CONSTITUTION: A plasma generation apparatus comprises a plurality of ground electrodes(120) which is arranged inside a vacuum container(102) and extended in parallel and one or more power electrodes(110) which is arranged between the ground electrodes. A discharge region with a predetermined interval between the power electrode and the ground electrode is included. The power electrode is tapered in a direction facing a substrate. The power electrode is connected to RF power(170). The vacuum container can have pressure below atmospheric pressure. The vacuum container can include an upper plate(104).