发明名称 MANUFACTURING METHOD FOR PROTECTIVE FILM OF SEMICONDUCTOR LASER ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method which reduces scratches on striped electrode due to a spacer when a protective film is manufactured on the side part of semiconductor laser bar. <P>SOLUTION: The manufacturing method for a protective filter of a semiconductor laser element includes: a step of forming a striped electrode 18 and a bonding pad 20 on a semiconductor laminate structure 14; a bar formation step of forming a multiple of semiconductor laser bars 30 by cutting substrates; a step of arranging the multiple of laser bars 30 on a loading surface 40 so that side surfaces 30b of the multiple of semiconductor laser bars 30 are directed towards a normal direction of the loading surface 40 and arranging a spacer 42 between the semiconductor laser bars 30; and a step of forming a protective film 32 so as to cover the side face 30b of the multiple of the semiconductor laser bars 30. Prior to the bar formation step, a film-shaped structure 22 whose hight based on a principal surface 12a is higher than the striped electrode 18 is formed on each of multiple parts of the semiconductor laminate structure 14 that constitutes each of the multiple of the semiconductor laser bars 30. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012174858(A) 申请公布日期 2012.09.10
申请号 JP20110034700 申请日期 2011.02.21
申请人 SUMITOMO ELECTRIC IND LTD 发明人
分类号 H01S5/028 主分类号 H01S5/028
代理机构 代理人
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