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发明名称
Photosensitive polyimide-based polymer, and positive type photoresist resin composition comprising the same
摘要
申请公布号
KR101179123(B1)
申请公布日期
2012.09.07
申请号
KR20090021503
申请日期
2009.03.13
申请人
发明人
分类号
C08G73/10;C08L79/08;G03F7/004
主分类号
C08G73/10
代理机构
代理人
主权项
地址
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