发明名称 AL ALLOY FILM FOR DISPLAY DEVICES OR SEMICONDUCTOR DEVICES, DISPLAY DEVICE OR SEMICONDUCTOR DEVICE EQUIPPED WITH AL ALLOY FILM, AND SPUTTERING TARGET
摘要 Provided is an Al alloy film for display devices, which has excellent heat resistance under high temperatures, low electric resistance (wiring resistance), and excellent corrosion resistance under alkaline environments. The present invention relates to an Al alloy film containing Ge (0.01-2.0 at.% ) and an X group element (Ta, Ti, Zr, Hf, W, Cr, Nb, Mo, Ir, Pt, Re, and/or Os), wherein, with regard to precipitates each containing Al, the X group element and Ge generated when a heat treatment at 450-600°C is carried out, the density of some of the precipitates which have equivalent circle diameters of 50 nm or more is controlled.
申请公布号 WO2012118039(A1) 申请公布日期 2012.09.07
申请号 WO2012JP54837 申请日期 2012.02.27
申请人 KABUSHIKI KAISHA KOBE SEIKO SHO(KOBE STEEL, LTD.);OKUNO HIROYUKI;KUGIMIYA TOSHIHIRO 发明人 OKUNO HIROYUKI;KUGIMIYA TOSHIHIRO
分类号 C23C14/14;C22C21/00;C22F1/00;C23C14/34;H01L21/28;H01L21/285;H01L21/3205;H01L23/52;H01L29/786 主分类号 C23C14/14
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