| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inspection system with a scanning electron microscope for performing an inspection for the purpose of detecting a defect on a substrate with a circuit pattern of a semiconductor device, a liquid crystal, or the like formed thereon which allows the easy identification of a minute defect and a pseudo one which have been hard to identify, and an inspection method thereof. <P>SOLUTION: The method comprises: detecting a defective position of a pseudo defect or true defect by adding up images or image signals obtained by performing a number of scans on each location, and comparing the images or image signals which are different in the number of additions with each other. In the method, which of a pseudo defect and a true defect to detect is determined by a combination of comparison operations on the images different in the number of additions. <P>COPYRIGHT: (C)2012,JPO&INPIT |
