| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which can obtain a resist pattern having excellent focus margin. <P>SOLUTION: The resist composition includes resin that contains a group unstable to an acid, is insoluble or difficult-soluble in an aqueous alkali solution, and acts with an acid to be dissolved in the aqueous alkali solution, an acid generator, a quencher including sulfonium salt or iodonium salt, and a solvent including cyclohexanone. <P>COPYRIGHT: (C)2012,JPO&INPIT |
