| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemical-mechanical abrasive composition capable of simultaneously polishing a barrier film and an insulating film at a high speed, while maintaining planarity by suppressing dishing and erosion. <P>SOLUTION: A chemical-mechanical abrasive composition contains a 7-13C dicarboxylic acid, an oxidant, abrasive grains, and water. Preferably, the abrasive composition has a value of pH 2-4 or 8-12. <P>COPYRIGHT: (C)2012,JPO&INPIT |
