| 发明名称 |
RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition for producing a resist pattern that has excellent CD uniformity (CDU) and few incidence numbers of defects. <P>SOLUTION: A resin including a structural unit represented by formula (aa) and a structural unit represented by formula (ab) and the resist composition using the resin are provided. <P>COPYRIGHT: (C)2012,JPO&INPIT |
| 申请公布号 |
JP2012167254(A) |
申请公布日期 |
2012.09.06 |
| 申请号 |
JP20120004702 |
申请日期 |
2012.01.13 |
| 申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
ICHIKAWA KOJI;SHIGEMATSU JUNJI;HASHIMOTO KAZUHIKO |
| 分类号 |
C08F220/28;G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
C08F220/28 |
| 代理机构 |
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| 主权项 |
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