| 摘要 |
<P>PROBLEM TO BE SOLVED: To use a laser beam to accurately and efficiently process and correct a prescribed position in an object. <P>SOLUTION: A defect correction device includes: a stage for placing a substrate; and a local exhaust ventilation system that comprises a local ventilation region that serves as a processing part for processing the substrate, a gas supply part for jetting gas toward the stage so that the system rises from the stage, and an exhaust part for exhausting gas jetted toward the stage and gas supplied from the local ventilation region to the stage side. The local exhaust ventilation system comprises switching means that switches between a raw material supply part for supplying source gas for thin-film formation and a local ventilation part for discharging dust generated within the local ventilation region by etching, one of which communicates with a flow channel leading to the local ventilation region. And, in the case of forming a thin film on a substrate, the switching means communicates the flow channel leading to the local ventilation region with the raw material supply part, and in the case of etching the substrate, it communicates the flow channel leading to the local ventilation region with the local ventilation part. <P>COPYRIGHT: (C)2012,JPO&INPIT |
