发明名称 Protecting semiconducting oxides
摘要 In transistor structures such as thin film transistors (TFTs) in an array of cells, a layer of semiconducting oxide material that includes a channel is protected by a protective layer that includes low-temperature encapsulant material. The semiconducting oxide material can be a transition metal oxide material such as zinc oxide, and can be in an active layered substructure that also includes channel end electrodes. The low-temperature encapsulant can, for example, be an organic polymer such as poly(methyl methacrylate) or parylene, deposited on an exposed region of the oxide layer such as by spinning, spin-casting, evaporation, or vacuum deposition or an inorganic polymer deposited such as by spinning or liquid deposition. The protective layer can include a lower sublayer of low-temperature encapsulant on the exposed region and an upper sublayer of inorganic material on the lower sublayer. For roll-to-roll processing, a mechanically flexible, low-temperature substrate can be used.
申请公布号 US8258021(B2) 申请公布日期 2012.09.04
申请号 US20070924678 申请日期 2007.10.26
申请人 NG TSE NGA;CHABINYC MICHAEL L.;PALO ALTO RESEARCH CENTER INCORPORATED 发明人 NG TSE NGA;CHABINYC MICHAEL L.
分类号 H01L21/00 主分类号 H01L21/00
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