发明名称 Method and apparatus for detecting plasma unconfinement
摘要 A method for detecting plasma unconfinement in a reaction chamber during a bevel edge cleaning operation is provided. The method initiates with selecting a wavelength associated with expected by products of a bevel edge clean process. The method includes cleaning the bevel edge area of a substrate and monitoring the intensity of the selected wavelengths during the cleaning for deviation from a threshold wavelength intensity. The cleaning is terminated if the deviation from the threshold wavelength intensity exceeds a target deviation.
申请公布号 US8257503(B2) 申请公布日期 2012.09.04
申请号 US20080114681 申请日期 2008.05.02
申请人 KIM KEECHAN;KIM YUNSANG;BAILEY, III ANDREW D.;LAM RESEARCH CORPORATION 发明人 KIM KEECHAN;KIM YUNSANG;BAILEY, III ANDREW D.
分类号 C25F3/30 主分类号 C25F3/30
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