发明名称 |
Method and apparatus for detecting plasma unconfinement |
摘要 |
A method for detecting plasma unconfinement in a reaction chamber during a bevel edge cleaning operation is provided. The method initiates with selecting a wavelength associated with expected by products of a bevel edge clean process. The method includes cleaning the bevel edge area of a substrate and monitoring the intensity of the selected wavelengths during the cleaning for deviation from a threshold wavelength intensity. The cleaning is terminated if the deviation from the threshold wavelength intensity exceeds a target deviation. |
申请公布号 |
US8257503(B2) |
申请公布日期 |
2012.09.04 |
申请号 |
US20080114681 |
申请日期 |
2008.05.02 |
申请人 |
KIM KEECHAN;KIM YUNSANG;BAILEY, III ANDREW D.;LAM RESEARCH CORPORATION |
发明人 |
KIM KEECHAN;KIM YUNSANG;BAILEY, III ANDREW D. |
分类号 |
C25F3/30 |
主分类号 |
C25F3/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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