发明名称 Semiconductor devices and semiconductor apparatuses including the same
摘要 Semiconductor devices and semiconductor apparatuses including the same are provided. The semiconductor devices include a body region disposed on a semiconductor substrate, gate patterns disposed on the semiconductor substrate and on opposing sides of the body region, and first and second impurity doped regions disposed on an upper surface of the body region. The gate patterns may be separated from the first and second impurity doped regions by, or greater than, a desired distance, such that the gate patterns do not to overlap the first and second impurity doped regions in a direction perpendicular to the first and second impurity doped regions.
申请公布号 US8258542(B2) 申请公布日期 2012.09.04
申请号 US20080219990 申请日期 2008.07.31
申请人 KIM WON-JOO;CHA DAE-KIL;LEE TAE-HEE;PARK YOON-DONG;SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM WON-JOO;CHA DAE-KIL;LEE TAE-HEE;PARK YOON-DONG
分类号 H01L29/66 主分类号 H01L29/66
代理机构 代理人
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