| 摘要 |
An application liquid supply apparatus supplying an application liquid to an application roller, includes: a space forming member which is abutted against an outer circumferential surface of the application roller and of which a recess section is formed along a breadthways direction of the application roller in a surface which abuts against the application roller, and a frame-shaped abutting section is provided in a projecting fashion so as to surround a perimeter of the recess section, the abutting section being abutted against the outer circumferential surface of the application roller so as to cover an opening of the recess section with the outer circumferential surface of the application roller in such a manner that an application liquid holding space is created along the breadthways direction on the outer circumferential surface of the application roller; at least one groove which has a length in a direction of rotation of the application roller and is formed in the abutting section on an upstream side in terms of the direction of the rotation of the application roller; an application liquid supply port which is formed in the space forming member and via which the application liquid is supplied to the application liquid holding space; and an application liquid supply device which supplies the application liquid to the application liquid holding space via the application liquid supply port. |
