发明名称 |
INTERCONNECTION STRUCTURE THROUGH SUBSTRATE AND METHOD OF MANUFACTURING THE SAME, AND DEVICE PACKAGE HAVING INTERCONNECTION STRUCTURE THROUGH SUBSTRATE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
PURPOSE: An interconnection structure through a substrate, a manufacturing method thereof, a device package having the same, and a manufacturing method for the device package are provided to reduce structure size by applying a reflow process to a via hole formed by etching a first substrate. CONSTITUTION: The center of a first substrate(100) has a recessed shape from a surface of an edge area. A first photo resist pattern is formed on the first substrate. A second substrate(200) is arranged on an recessed area of the first substrate. The second substrate has a through structure of having a predetermined pattern. A via plug(230) is formed passing through both sides of the second substrate. |
申请公布号 |
KR20120097310(A) |
申请公布日期 |
2012.09.03 |
申请号 |
KR20110107880 |
申请日期 |
2011.10.21 |
申请人 |
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, DANKOOKUNIVERSITY |
发明人 |
PARK, JAE HYOUNG;LEE, SEUNG KI;LEE, JU YONG |
分类号 |
H01L23/48;H01L21/60;H01L23/045;H01L23/055 |
主分类号 |
H01L23/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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