发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PURPOSE: A semiconductor manufacturing device is provided to form a spraying unit of a line shape, thereby preventing a substrate from being damaged in a wet etching process. CONSTITUTION: A container(100) is composed of an internal container(120) and an external container(140). A substrate supporting unit(200) is comprised in the container. A solution spraying unit(300) is arranged in the lower part of the substrate supporting unit. The solution spraying unit comprises a body, a spraying line(340) being formed on the top of the body, and a solution supplying pipe. A solution supplying unit(400) supplies solution to the solution spraying unit.
申请公布号 KR20120096653(A) 申请公布日期 2012.08.31
申请号 KR20110015859 申请日期 2011.02.23
申请人 LG SILTRON INCORPORATED 发明人 LEE, JI SUN
分类号 H01L21/306 主分类号 H01L21/306
代理机构 代理人
主权项
地址