| 摘要 |
PURPOSE: An organic developing treatment method and an organic development treating device are provided to improve work efficiency by stabilizing a critical dimension of a circuit pattern without the influence of a time lag of an organic developing treatment. CONSTITUTION: A returning sphere(12) of a wafer(W) is formed in a lateral wall of a housing(11). A substrate holding chuck(20) arranging a wafer in a horizontal state is installed in the housing. The substrate holding chuck is rotated in a horizontal direction by driving of a rotary driving motor(21). The rotary driving motor, an elevating device(25), and a vacuum pump(24) are electrically connected to a controlling unit(100). A nozzle body(50) having a developing solution supplying nozzle(30) and a gas supplying nozzle(40) is mounted in the bottom of a top plate(26a) of a cover body(26).
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