发明名称 THIN-FILM SOLAR FABRICATION PROCESS, DEPOSITION METHOD FOR A LAYER STACK OF A SOLAR CELL, AND SOLAR CELL PRECURSOR
摘要 <p>A method of depositing layer stacks for photoelectric conversion devices, e.g., solar cells and corresponding layer stacks or solar cell precursors are described. The method includes depositing a first conductivity-type silicon-containing layer for a p-i-n-junction of a solar cell, depositing an intrinsic-type silicon containing layer for a p-i-n-junction of a solar cell, and depositing a second conductivity-type layer with a conductivity-type opposite to the first conductivity-type layer. The method further includes providing a back contact, wherein the second conductivity type layer is deposited between the intrinsic- type layer and the back contact, and wherein the further conductivity-type layer is deposited by chemical vapor deposition using CO2.</p>
申请公布号 WO2012113441(A1) 申请公布日期 2012.08.30
申请号 WO2011EP52537 申请日期 2011.02.21
申请人 APPLIED MATERIALS, INC.;KLEIN, STEFAN;ROHDE, MARTIN;SCHWANITZ, KONRAD;STOLLEY, TOBIAS;STOEMMER, CHRISTIAN;BUSCHBAUM, SUSANNE 发明人 KLEIN, STEFAN;ROHDE, MARTIN;SCHWANITZ, KONRAD;STOLLEY, TOBIAS;STOEMMER, CHRISTIAN;BUSCHBAUM, SUSANNE
分类号 H01L31/0368;H01L31/0376;H01L31/0392;H01L31/076 主分类号 H01L31/0368
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