发明名称 METHOD OF MANUFACTURING CONDUCTIVE PATTERN FORMATION SUBSTRATE, AND CONDUCTIVE PATTERN FORMATION SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a conductive pattern formation substrate and the conductive pattern formation substrate, in which manufacture is easy, a high quality transparent conductive film having a hardly visible conductive pattern can be formed in a display region, and electrical reliability is improved by fully securing insulating properties of an insulating part of the transparent conductive film. <P>SOLUTION: The method of manufacturing the conductive pattern formation substrate includes: a step of printing a base material a having mesh-like members disposed in a transparent base material in a display region 13 on an insulating substrate 11; a step in which cavities are formed by irradiating the base film a with laser beam L to make a transparent conductive film 12; and a step of forming a wiring line 14 electrically connected to a conductive part C of the transparent conductive film 12 in a wiring region 15 of the insulating substrate 11. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012164553(A) 申请公布日期 2012.08.30
申请号 JP20110024830 申请日期 2011.02.08
申请人 SHIN ETSU POLYMER CO LTD 发明人 NISHIZAWA KOJI;KUNISHI YOSUKE;KOMATSU HIROTO
分类号 H01B13/00;G06F3/041;H01B5/14 主分类号 H01B13/00
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