发明名称 ATTACHMENT FOR SUBSTRATES HAVING DIFFERENT DIAMETERS, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SUBSTRATE OR SEMICONDUCTOR DEVICE
摘要 A downsized substrate may be housed in a substrate accommodation vessel (FOUP) constituting a transfer system corresponding to a large diameter substrate. An attachment includes an upper plate and a lower plate supported by a first support groove that can support an 8-inch wafer, and holding columns installed at the upper plate and the lower plate and including a second support groove that can support a 2-inch wafer (if necessary, via a wafer holder and a holder member). Accordingly, the 2-inch wafer can be housed in a pod corresponding to the 8-inch wafer, and the pod, which is a transfer system, can be standardized to reduce cost of a semiconductor manufacturing apparatus. In addition, a distance from each gas supply nozzle to the wafer can be increased to sufficiently mix reactive gases before arrival at the wafer and improve film-forming precision to the wafer.
申请公布号 US2012216743(A1) 申请公布日期 2012.08.30
申请号 US201213407225 申请日期 2012.02.28
申请人 ITOH TAKESHI;TANAKA AKINORI;HITACHI KOKUSAI ELECTRIC INC. 发明人 ITOH TAKESHI;TANAKA AKINORI
分类号 H01L21/205;C30B25/02;F16M13/00 主分类号 H01L21/205
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