METHOD FOR FORMING LAYER WITHIN MEMS DEVICE TO ACHIEVE TAPERED EDGE

摘要

PROBLEM TO BE SOLVED: To provide a method for forming layers within a MEMS device to achieve a tapered edge.

SOLUTION: Certain MEMS devices include layers patterned to have tapered edges. One method for forming layers having tapered edges includes the use of an etch leading layer. Another method for forming layers having tapered edges includes the deposition of a layer in which the upper portion is etchable at a faster rate than the lower portion. Another method for forming layers having tapered edges includes the use of multiple iterative etches. Another method for forming layers having tapered edges includes the use of a liftoff mask having an aperture including a negative angle, such that a layer can be deposited over the liftoff mask and the mask layer is removed, thereby leaving a structure having tapered edges.

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