SUBSTRATE HOLDING APPARATUS, SUBSTRATE STAGE, EXPOSURE DEVICE, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND LIQUID-REPELLENT PLATE

摘要

PROBLEM TO BE SOLVED: To provide a substrate holding apparatus which enables easy maintenance work and prevents a liquid from intruding into a rear surface side of each substrate.

SOLUTION: A substrate holder PH includes: a base material PHB; a first holding part PH1 which is formed on the base material PHB and holds a substrate P by suctioning the substrate; and a second holding part PH2 which is formed on the base material PHB and holds a plate member T by suctioning the plate member near the substrate P suctioned and held by the first holding part PH1. An exposure device including the substrate holder PH allows a plate to be easily replaced, and thus maintenance work is easy. Therefore, the exposure device is suitable for immersion exposure.

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