发明名称 |
Method and apparatus for extended temperature pyrometry |
摘要 |
Embodiments of the invention are directed to methods and apparatus for rapid thermal processing of a substrate over an extended temperature range, including low temperatures. Systems and methods for using an extended temperature pyrometry system employing a transmitted radiation detector system are disclosed. Systems combining transmitted radiation detector systems and emitted radiation detector systems are also described. |
申请公布号 |
US8254767(B2) |
申请公布日期 |
2012.08.28 |
申请号 |
US20090547605 |
申请日期 |
2009.08.26 |
申请人 |
HUNTER AARON M.;LI JIPING;RAMANUJAM RAJESH S.;HAW THOMAS;APPLIED MATERIALS, INC. |
发明人 |
HUNTER AARON M.;LI JIPING;RAMANUJAM RAJESH S.;HAW THOMAS |
分类号 |
A21B2/00 |
主分类号 |
A21B2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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