发明名称 METHOD FOR PRODUCING GRANULAR GALLIUM OXIDE
摘要 <P>PROBLEM TO BE SOLVED: To provide a granular gallium oxide which is fine, has a large BET specific surface area, and hard to collapse, when fed to apparatuses for producing single crystal substrates and the like as a raw material. <P>SOLUTION: The method for producing granular gallium oxide comprises a step of obtaining gallium hydroxide by mixing an aqueous solution of gallium nitrate having concentration of not more than 1.5 mol/L and a basic solution while adjusting the pH in the range of 8-10; a heat treatment step of obtaining gallium oxyhydroxide by keeping the resultant gallium hydroxide at a temperature of not lower than 60&deg;C at a pH of 8-10 for not less than one hour; and a step of obtaining granular gallium oxyhydroxide by granulating the gallium oxyhydroxide obtained in the heat treatment step; and a step of obtaining the granular gallium oxide by firing the granular gallium oxyhydroxide. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012158483(A) 申请公布日期 2012.08.23
申请号 JP20110017659 申请日期 2011.01.31
申请人 SUMITOMO CHEMICAL CO LTD 发明人 SATO HISAYA
分类号 C01G15/00 主分类号 C01G15/00
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