发明名称 SOLID-STATE IMAGING ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a solid-state imaging element including a photoelectric conversion element made of an organic material, capable of preventing a dark current. <P>SOLUTION: In a semiconductor substrate 1 below a photoelectric conversion part including a pair of electrodes 11 and 13 and a photoelectric conversion layer 12a arranged between the pair of electrodes 11 and 13 and absorbing green light, a blue-color photodiode having a pn-junction surface formed at a position where blue light can be absorbed, and a red-color photodiode having the pn-junction surface at a position where red light can be absorbed, are formed. A relative dielectric constant of a blocking layer 12b provided between the electrode 13 and the photoelectric conversion layer 12a is larger than that of the photoelectric conversion layer 12a. A value obtained by dividing a thickness of the photoelectric conversion layer 12a by the relative dielectric constant is larger than a value obtained by dividing a thickness of the blocking layer 12b by the relative dielectric constant. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012160770(A) 申请公布日期 2012.08.23
申请号 JP20120124590 申请日期 2012.05.31
申请人 FUJIFILM CORP 发明人 YOKOYAMA DAISUKE
分类号 H01L31/10 主分类号 H01L31/10
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