| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for safely treating polysilanes formed as by-products when a microcrystalline silicon film is formed by a CVD process. <P>SOLUTION: Regarding the method for treating polysilanes, when a microcrystalline silicon film or an amorphous silicon film is deposited on a substrate by a plasma CVD process, polysilanes produced as by-products in a vacuum chamber, and deposited and stuck inside a vacuum pump are treated, wherein, an organic solvent selected from lubricating oils is poured and filled into the vacuum pump and is left for a prescribed time, next, the vacuum pump is dismantled, and the dismantled components stuck with the polysilane-dispersed organic solvent are cleaned with a cleaning oil. <P>COPYRIGHT: (C)2012,JPO&INPIT |
