发明名称
摘要 <p>In a method for the treatment of silicon wafers in the production of solar cells, a treatment liquid is applied to the surface of the silicon wafers for the purpose of texturization thereof. The treatment liquid contains, as additive, ethyl hexanol or cyclohexanol in an amount ranging from 0.5% to 3%, by weight.</p>
申请公布号 JP2012519389(A) 申请公布日期 2012.08.23
申请号 JP20110552429 申请日期 2010.03.03
申请人 发明人
分类号 H01L31/04 主分类号 H01L31/04
代理机构 代理人
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地址