METHOD OF FORMING NANO DIMPLE PATTERN AND NANOSTRUCTURE

摘要

PURPOSE: A formation method of nano-dimple patterns and nano-structures are provided to form nano-dimple patterns without nano-masks and lithographic process. CONSTITUTION: A formation method of nano-dimple patterns comprises the following steps: forming a mask layer(110) which includes polymer particles(112) on a substrate(105); selectively etching the surface of the substrate by using the mask layer as an etching protection layer; and forming a nano-dimple pattern(120) on the top of the substrate. The mask layer has openings(115) which expose the substrate between the polymer particles. The mask layer formation step comprises the following step: forming a monolayer of polystyrene particles on top of the substrate by using a spin coating method. The nano-dimple pattern formation step comprises the following step: etching the substrate by providing fluorine steam vapor on top of the substrate through the opening.