发明名称 Substrate processing apparatus and semiconductor device producing method
摘要 Disclosed is a substrate processing apparatus, including a reaction tube to process a substrate therein, wherein the reaction tube includes an outer tube, an inner tube disposed inside the outer tube, and a support section to support the inner tube, the inner tube and the support section are made of quartz or silicon carbide, and a shock-absorbing member is provided between the support section and the inner tube.
申请公布号 US8246749(B2) 申请公布日期 2012.08.21
申请号 US20060989488 申请日期 2006.07.20
申请人 WANG JIE;YAMAMOTO RYUJI;NAKASHIMA SADAO;HITACHI KOKUSAI ELECTRIC, INC. 发明人 WANG JIE;YAMAMOTO RYUJI;NAKASHIMA SADAO
分类号 C23C16/44;H01L21/31 主分类号 C23C16/44
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