发明名称 Method of enhancing charge storage in an E2PROM cell
摘要 A method is provided for enhancing charge storage in an E2PROM cell structure that includes a read transistor having spaced apart source an drain diffusion regions formed in a semiconductor substrate to define a substrate channel region therebetween, a conductive charge storage element formed over the substrate channel region and separated therefrom by gate dielectric material, a conductive control gate that is separated from the charge storage element by intervening dielectric material, and a conductive heating element disposed in proximity to the charge storage element. The method comprises performing a programming operation that causes charge to be placed on the charge storage element and, during the programming operation, heating the heating element to a temperature such that heat is provided to the charge storage element.
申请公布号 US8247862(B2) 申请公布日期 2012.08.21
申请号 US20100716101 申请日期 2010.03.02
申请人 BABCOCK JEFF A;MIRGORODSKI YURI;LAVROVSKAYA NATALIA;DESAI SAURABH;NATIONAL SEMICONDUCTOR CORPORATION 发明人 BABCOCK JEFF A;MIRGORODSKI YURI;LAVROVSKAYA NATALIA;DESAI SAURABH
分类号 G11C16/04 主分类号 G11C16/04
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