发明名称 Transistor, semiconductor device including the transistor, and manufacturing method of the transistor and the semiconductor device
摘要 An object is to suppress deterioration in electric characteristics in a transistor including an oxide semiconductor layer or a semiconductor device including the transistor. In a transistor in which a channel layer is formed using an oxide semiconductor, a silicon layer is provided in contact with a surface of the oxide semiconductor layer, an impurity semiconductor layer is provided over the silicon layer, and a source electrode layer and a drain electrode layer are provided to be electrically connected to the impurity semiconductor layer.
申请公布号 US8247812(B2) 申请公布日期 2012.08.21
申请号 US20100699969 申请日期 2010.02.04
申请人 SAKATA JUNICHIRO;GODO HIROMICHI;SHIMAZU TAKASHI;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 SAKATA JUNICHIRO;GODO HIROMICHI;SHIMAZU TAKASHI
分类号 H01L29/786 主分类号 H01L29/786
代理机构 代理人
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