发明名称 Lithographic apparatus and calibration method
摘要 In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal representative of a difference between the setpoint signal and the position of the stage as measured by the sensor head is registered. The stage system is calibrated from the registered signal representative of the difference.
申请公布号 US8248583(B2) 申请公布日期 2012.08.21
申请号 US20090367193 申请日期 2009.02.06
申请人 VAN DEN BRINK MARINUS AART;BUTLER HANS;EUSSEN EMIEL JOZEF MELANIE;VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS;VAN DER WIJST MARC WILHELMUS MARIA;ANGELIS GEORGO;KLAVER RENATUS GERARDUS;HAMERS MARTIJN ROBERT;VERHAAR BOUDEWIJN THEODORUS;HOEKSTRA PETER;ASML NETHERLANDS B.V. 发明人 VAN DEN BRINK MARINUS AART;BUTLER HANS;EUSSEN EMIEL JOZEF MELANIE;VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS;VAN DER WIJST MARC WILHELMUS MARIA;ANGELIS GEORGO;KLAVER RENATUS GERARDUS;HAMERS MARTIJN ROBERT;VERHAAR BOUDEWIJN THEODORUS;HOEKSTRA PETER
分类号 G03B27/52 主分类号 G03B27/52
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