发明名称 Semi-polar nitride-based light emitting structure and method of forming same
摘要 A structure and method for producing same provides a solid-state light emitting device with suppressed lattice defects in epitaxially formed nitride layers over a non-c-plane oriented (e.g., semi-polar) template or substrate. A dielectric layer with “window” openings or trenches provides significant suppression of all diagonally running defects during growth. Posts of appropriate height and spacing may further provide suppression of vertically running defects. A layer including gallium nitride is formed over the dielectric layer, and polished to provide a planar growth surface with desired roughness. A tri-layer indium gallium nitride active region is employed. For laser diode embodiments, a relatively thick aluminum gallium nitride cladding layer is provided over the gallium nitride layer.
申请公布号 US8247249(B2) 申请公布日期 2012.08.21
申请号 US20100791552 申请日期 2010.06.01
申请人 STRITTMATTER ANDRE;JOHNSON NOBLE M.;TEEPE MARK;CHUA CHRISTOPHER L.;YANG ZHIHONG;NORTHRUP JOHN E.;PALO ALTO RESEARCH CENTER INCORPORATED 发明人 STRITTMATTER ANDRE;JOHNSON NOBLE M.;TEEPE MARK;CHUA CHRISTOPHER L.;YANG ZHIHONG;NORTHRUP JOHN E.
分类号 H01L21/00 主分类号 H01L21/00
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