发明名称 METHODS FOR FABRICATING PASSIVATED SILICON NANOWIRES AND DEVICES THUS OBTAINED
摘要 <p>Methods for fabricating passivated silicon nanowires and an electronic arrangement thus obtained are described. Such arrangements may comprise a metal-oxide-semiconductor (MOS) structure such that the arrangements may be utilized for MOS field-effect transistors (MOSFETs) or opto-electronic switches.</p>
申请公布号 KR20120092091(A) 申请公布日期 2012.08.20
申请号 KR20127001670 申请日期 2010.06.23
申请人 CALIFORNIA INSTITUTE OF TECHNOLOGY 发明人 SCHERER AXEL;WALAVALKAR SAMEER;HENRY MICHAEL D.;HOMYK ANDREW P.
分类号 H01L21/336;H01L29/78 主分类号 H01L21/336
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