发明名称 |
PLASMA DEVICE AND SYSTEM |
摘要 |
FIELD: metallurgy. ^ SUBSTANCE: double-type plasma device includes anode plasma head and cathode plasma head. Each of the plasma heads includes an electrode and plasma flow channel, and inlet element for the main gas at least between the part of electrode and plasma flow channel. Anode plasma head and cathode plasma head are oriented at some angle in the direction to each other. At least one of the plasma flow channels includes three cylindrical sections. ^ EFFECT: three cylindrical sections of plasma flow channels provide the reduction of occurrence of secondary arches. ^ 14 cl, 12 dwg |
申请公布号 |
RU2459010(C2) |
申请公布日期 |
2012.08.20 |
申请号 |
RU20090124486 |
申请日期 |
2007.11.27 |
申请人 |
BELASHCHENKO VLADIMIR E.;SOLONENKO OLEG PAVLOVICH;SMIRNOV ANDREJ VLADIMIROVICH |
发明人 |
BELASHCHENKO VLADIMIR E.;SOLONENKO OLEG PAVLOVICH;SMIRNOV ANDREJ VLADIMIROVICH |
分类号 |
B23K10/00;C23C4/12;H05H1/44 |
主分类号 |
B23K10/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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