EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE

摘要

An exposure apparatus EX projects a pattern image onto a substrate W via a projection optical system PL and a liquid LQ, and the projection optical system PL has an optical member G12 that comes into contact with the liquid LQ and an optical group MPL arranged between the optical member G12 and a reticle R. A holding mechanism HG that holds the optical member G12 and the optical group MPL holds the optical member G12 so that it is movable relative to the optical group MPL. Through such a configuration, it is possible to provide an exposure apparatus that is able to restrict deterioration of the pattern image when the space between the projection optical system and the substrate is filled with liquid and exposure processing is performed.